Welcome to our world!
During the nearly 27 years of existence of the FLOSLEK Cosmetic Laboratory, we have developed almost 400 formulations, creating dozens of specialized skin care lines, using nearly 1500 different cosmetic raw materials. Since 2011, we have been sharing our knowledge and experience with Private Label customers, whom we have the pleasure and honour to support in the process of creating their own cosmetic brands.
We offer our clients comprehensive services tailored to the individual needs of each project.
Quality
We pay great attention to the high standards of production, safety and quality of the products we create. We are ISO 9001 : 2015 certified for the design, production and sale of cosmetic preparations and ISO 22716 : 2009 (GMP) certified for the highest quality standards of the products manufactured in our company. Both certificates were awarded to us and are renewed annually by the internationally recognised certification body TÜV Nord.
Our own R&D laboratory
We keep abreast of changes in cosmetic trends and actively seek new technological solutions. We have our own R&D (Research and Development) laboratory. New formulas are the result of the work of a team consisting of qualified chemists, biotechnologists and pharmacists who watch over the quality and safety of products. We provide our Private Label clients with experience in the development and testing of cosmetic products.
Machinery park
The range of services offered to Private Label customers also includes contract manufacturing and confectioning of cosmetic products. We have a modern and extensive machine park at our disposal, which allows us to flexibly adapt to the requirements of our customers and to realise orders quickly.
Service
We provide our Private Label customers with a professional and friendly service which enables us to realise a project from the very idea to the finished product. We are well acquainted with legal regulations and provisions concerning cosmetic law and we offer our customers care and consultancy in this field.
